发明名称 Semiconductor wafer alignment device, has a rotating plate with supports on its outer edge on which the edges or edge regions of the wafer are supported during wafer rotation and alignment
摘要 <p>Device for aligning a wafer has a rotating plate (1) that supports the wafer and which can be rotated about its rotation axis (M) for the purpose of aligning the wafer. The rotating plate is designed so that the wafer is only supported on its edge or edge region. An independent claim is made for a handling device for processing a wafer, especially a marking device for marking or writing on the wafer using a laser beam. The device has a misalignment detection device that generates displacement signal or displacement information.</p>
申请公布号 DE202004011907(U1) 申请公布日期 2004.12.02
申请号 DE20042011907U 申请日期 2004.07.30
申请人 INNOLAS GMBH 发明人
分类号 H01L21/68;H01L21/687;(IPC1-7):H01L21/68;H01L21/66;G01B11/27;H01L23/544 主分类号 H01L21/68
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