发明名称 FIELD-EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a field-effect transistor wherein carrier mobility can be improved. SOLUTION: The field-effect transistor is provided with at least (A) a channel formation region 18 formed in a semiconductor layer 17, and (B) a gate electrode 12 which is arranged in face to face with the channel formation region 18 through a gate insulating layer 13. In the semiconductor layer 17, a semiconductor material layer 15 and conductive particles 16 are intermingled. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004335688(A) 申请公布日期 2004.11.25
申请号 JP20030128861 申请日期 2003.05.07
申请人 SONY CORP 发明人 NODA MAKOTO
分类号 H01L51/05;H01L21/336;H01L29/78;H01L29/786;H01L51/00;H01L51/30;H01L51/40;(IPC1-7):H01L29/786 主分类号 H01L51/05
代理机构 代理人
主权项
地址