发明名称 |
Process for producing abrasive particles and abrasive particles produced by the process |
摘要 |
The present invention provides a process for producing particles suitable for use as abrasives in chemical-mechanical polishing slurries. The process according to the invention includes mixing at least one crystallization promoter such as Ti[OCH(CH3)2)]4 with at least one cerium compound and at least one solvent, and subjecting said mixture to hydrothermal treatment at a temperature of from about 60° C. to about 700° C. to produce the particles. Particles formed in accordance with the present invention exhibit a large crystallite size, and can be used to polish silicon-containing substrates to a high degree of planarity at a relatively high rate.
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申请公布号 |
US6818030(B2) |
申请公布日期 |
2004.11.16 |
申请号 |
US20020255136 |
申请日期 |
2002.09.25 |
申请人 |
FERRO CORPORATION |
发明人 |
FENG XIANGDONG;HER YIE-SHEIN |
分类号 |
C01F17/00;C01G23/04;C01G23/053;C03C19/00;C09C1/36;C09C1/68;C09K3/14;(IPC1-7):C09K3/14;C09G1/02;C09G1/04 |
主分类号 |
C01F17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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