发明名称 Photovoltaic element and method of forming photovoltaic element
摘要 The present invention provides a photovoltaic element including a structure with a first pin-junction having an i-type semiconductor layer made of amorphous silicon and a second pin-junction having an i-type semiconductor layer contains crystalline silicon which are arranged in series on a substrate, wherein the first pin-junction has a first intermediate layer at a p/i interface and a second intermediate layer at an n/i interface, and the second pin-junction has a third intermediate layer at a p/i interface and a fourth intermediate layer at an n/i interface, and wherein the second intermediate layer and the third intermediate layer are made of amorphous silicon and the first intermediate layer and the fourth intermediate layer contain crystalline silicon, or wherein the second intermediate layer and the third intermediate layer contain crystalline silicon and the first intermediate layer and the fourth intermediate layer are made of amorphous silicon.
申请公布号 US2004221887(A1) 申请公布日期 2004.11.11
申请号 US20040833125 申请日期 2004.04.28
申请人 CANON KABUSHIKI KAISHA 发明人 KONDO TAKAHARU;SANO MASAFUMI;TAKAI YASUYOSHI;HIGASHIKAWA MAKOTO;TSUZUKI HIDETOSHI;NAKAMURA TETSURO
分类号 H01L31/04;H01L31/00;H01L31/0224;H01L31/036;H01L31/0368;H01L31/042;H01L31/072;H01L31/075;H01L31/18;H01L31/20;(IPC1-7):H01L31/00 主分类号 H01L31/04
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