| 摘要 |
PROBLEM TO BE SOLVED: To provide a load lock system and an exposure treatment system, and a fabrication method of device for ensuring a prescribed throughput as well as for achieving a high quality processing. SOLUTION: The load lock system includes: a load lock chamber 3 disposed between a storage port 10 for storing a substrate and a processing chamber 1 for processing the substrate in a processing space of which pressure is maintained lower than the external pressure; and a dehumidifying unit 97 for forming a dehumidified atmosphere in the load lock chamber 3. The load lock system further includes another chamber 9 between the storage port 10 and the load lock chamber 3, and the dehumidifying unit 97 dehumidifies the chamber 9. COPYRIGHT: (C)2005,JPO&NCIPI |
