发明名称 GAS BLOW-OUT TYPE LADDER ELECTRODE AND VACUUM TREATMENT SYSTEM EQUIPPED THEREWITH
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas blow-out type ladder electrode capable of improving a film forming speed by reducing the spacing between the gas blow-out type ladder electrode and a substrate. <P>SOLUTION: The gas blow-out type ladder electrode 10 is arranged between a heater cover 11 for supporting a substrate K to be treated and a contamination plate 12, supplies gas into a space S enclosed by the heater cover 11 and the contamination plate 12, has a function as an electrode and comprises a gas supply pipe, an upper gas header 10a and lower gas header 10b connected to the gas supply pipe and a plurality of gas pipes 10c connected between the upper gas header 10a and the lower gas header 10b. Gas blow-out holes 10d disposed at the gas pipes 10c in order to blow out the gas into the space S are so punched as to prevent the main stream of gas blown out of the gas blow-out holes 10d from perpendicularly hitting the substrate K to be treated. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004292872(A) 申请公布日期 2004.10.21
申请号 JP20030085610 申请日期 2003.03.26
申请人 MITSUBISHI HEAVY IND LTD 发明人 SASAGAWA EISHIRO;UENO MOICHI;HASHIMOTO AKIRA;KAWAMURA KEISUKE
分类号 H05H1/46;B01J3/00;B01J3/02;B01J19/08;C23C16/455;C23F4/00;H01L21/3065;H01L21/31 主分类号 H05H1/46
代理机构 代理人
主权项
地址