Method of making NiFeCo-O-N or NiFeCo-N films for shields and/or poles of a magnetic head

摘要

A specified amount of N2O or N2 is employed in a process gas of a DC magnetron for sputter depositing single or laminated films of NiFeCo-O-N or NiFeCo-N with a high uniaxial anisotropy HK after annealing these films along their hard axes. The films can be used for shield layers and/or pole piece layers in a magnetic head.