发明名称 SYSTEM AND PROCESS FOR PRODUCING SEMICONDUCTOR CHIP, SEMICONDUCTOR CHIP, SEMICONDUCTOR DEVICE, ELECTRONIC DEVICE, AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor chip in which variation in the height of electrodes is suppressed, a system and a process for producing such a semiconductor chip, a semiconductor device comprising that semiconductor chip, an electronic device and an electronic apparatus. <P>SOLUTION: The semiconductor chip is produced by a process comprising a step for chemically processing a semiconductor substrate in a chemical processing tub 10, and a step for cleaning the semiconductor substrate in a rinse tank. Chemical processing is carried out under such an environment as the chemical processing tub is shaded and the cleaning is carried out under such an environment as the rinse tank is not shaded. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004273958(A) 申请公布日期 2004.09.30
申请号 JP20030065823 申请日期 2003.03.11
申请人 SEIKO EPSON CORP 发明人 YODA TAKESHI
分类号 H01L21/60 主分类号 H01L21/60
代理机构 代理人
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