发明名称 AIR GAP FORMATION
摘要 PROBLEM TO BE SOLVED: To provide a method of forming an air gap, especially useful as insulation between metal wires in an electronic device such as an electric wiring structure, within a solid structure. SOLUTION: A metal wire 15 is arranged on a dielectric layer 10 arranged on a base substrate 5. A sacrificial material 20 is arranged to a region between the metal wires 15 and is on the dielectric layer 10. A porous overlay 25 is arranged on the metal wire 15 and the sacrificial material 20. To leave the air gap, the sacrificial material is deteriorated and decomposed by heat, etc., and removed through the overlay. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004266244(A) 申请公布日期 2004.09.24
申请号 JP20030320111 申请日期 2003.09.11
申请人 ROHM & HAAS ELECTRONIC MATERIALS LLC 发明人 GALLAGHER MICHAEL K
分类号 B81B7/00;H01L21/764;H01L21/768;H01L23/522;(IPC1-7):H01L21/768 主分类号 B81B7/00
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