PHOTOMASK FOR PROXIMITY FIELD EXPOSURE

摘要

PROBLEM TO BE SOLVED: To prevent fracture of a mask due to local concentration of stress produced in the boundary region between a supporting body and a membrane part when the membrane part of a proximity field exposure photomask bends.

SOLUTION: In the photomask for proximity field exposure comprising a supporting body and a membrane part which is supported by the supporting body and which has a light shielding film having minute openings on one face of the membrane, the photomask has a structure which relaxes the stress produced in the boundary between the membrane part and the supporting body when the membrane part bends.

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