| 摘要 |
PROBLEM TO BE SOLVED: To prevent the fixing of a substrate using an absorption pad from being unstable by managing the relative position of the substrate with respect to the absorption pad for fixing the substrate. SOLUTION: A reticle positioning apparatus is assembled in an exposure system and positions a reticle to fix it on a reticle stage 1. The reticle stage 1 has an absorption pad 12 which is fixed on the reticle stage 1 and absorbs a reticle for fixing it. The reticle is so moved and positioned with respect to the reticle stage 1 as to coincide reticle alignment marks on the reticle with reticle reference marks 11 on the reticle stage 1 by the cooperative work of an end-face positioning device 3, a reticle transportation hand 2, and a reticle alignment hand 5. The relative position of the reticle at this stage with respect to the absorption pad 12 is so managed as to judge whether the absorption pad 12 can normally absorb the substrate or not. COPYRIGHT: (C)2004,JPO&NCIPI |
