| 摘要 |
Attention is paid to the phenomenon that a static image distortion characteristic is averaged in the width of a projection area in a scanning direction and becomes a dynamic image distortion characteristic, when a mask pattern is scan-exposed onto a photosensitized substrate by a projection exposure apparatus. At least a random component included in the dynamic image distortion characteristic is corrected by arranging an image correction plate obtained by locally polishing the surface of a transparent parallel plate. Correction plates which minimize other aberrations beforehand are manufactured and installed within a projection optical path, considering that also the other aberrations are averaged and become dynamic aberration characteristics at the time of scan-exposure. In this way, an exposure apparatus for reducing respective aberration types caused by an illumination optical system within an projection optical system of the projection exposure apparatus using an ultraviolet illumination light is provided. <IMAGE> |
