| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical system which can change the position of an emission pupil, in which the intensity of irradiation light will not decrease. SOLUTION: In inspecting a solid-state imaging element, the position of the emission pupil of these optical systems is matched with the position of an incident pupil of the solid-state imaging element 10, by changing the focal position of a field lens system 8, the imaging position of a single projection optical system 7 is matched with the front side principal point of the field lens system, so that a second projection optical system adjustment for a second projection optical system and the rear side principal point of the field lens system 8 becomes conjugates with the surface to be inspected. Projection of an inspection chart 6, on the imaging surface of the solid-state imaging element 10 or on the irradiation of the imaging surface of the solid-state imaging element 10, is then performed in a state, in which the inspection chart 6 is out. Thus, vignetting of the light rays due to the difference in the positions of the pupils is reduced, and uniform illumination can be carried out. COPYRIGHT: (C)2004,JPO&NCIPI
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