| 摘要 |
PURPOSE: A method and an apparatus for continuously injecting metal in a vacuum thermal deposition system are provided to improve mass production capability and yield of the vacuum thermal deposition system and reduce contamination by enabling continuous material injection without stopping of vacuum. CONSTITUTION: The vacuum thermal deposition apparatus comprising a metal injection part(50) installed in chamber(90), wherein the metal injection part comprises a metal storage part(10); a crushing part(20) for crushing metal discharged from the metal storage part into a certain size; and metal supply part(40,30) for supplying the crushed metal to a deposition source(80), wherein the metal storage part further comprises first discharge means for discharging metal stored to the outside of the storage part, wherein the crushing part is a cutting means for cutting metal into a certain size, or a crushing means for crushing the frozen metal by rapidly freezing the metal, wherein the crushing means crushes the rapidly frozen metal by applying impact to the rapidly frozen metal after rapidly freezing the metal using carbonic acid gas or liquefied nitrogen, wherein the cutting part comprises a cutting means; and a cutting means supporting part fixed or movably attached to one side of the metal injection part to support the cutting means, wherein the cutting means is a heated tungsten wire or metal cutting knife blade, wherein the metal supplying part comprises a temporary storage part(40) for temporarily storing the crushed metal; and second discharge means(30) for injecting the temporarily stored metal into the deposition source.
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