发明名称 METHOD OF MANUFACTURING ELECTRO-OPTIC APPARATUS, ELECTRO-OPTIC APPARATUS AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing an electro-optic apparatus by which minute scratches and cracks present on a substrate edge and a cut face can be eliminated by etching without damaging conductors and IC chips, and to provide an electro-optic apparatus and an electronic equipment. SOLUTION: After a liquid crystal panel 1' to be used for an electro-optic apparatus is cut out into a single product size, the substrate edges and the cut faces of a first substrate 10 and a second substrate 20 are subjected to wet etching as in the state of a single product of the liquid crystal panel 1' to eliminate minute scratches and cracks from the substrate edges and the cut faces prior to fabricating ICs. In this process, the wiring part 51, 71, substrate mounting terminal 28, alignment mark 55 and driving IC 13 formed in a protruding region 25 are covered with a protective layer. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004206097(A) 申请公布日期 2004.07.22
申请号 JP20030411843 申请日期 2003.12.10
申请人 SEIKO EPSON CORP 发明人 MURAI HIDETOSHI;HANAKAWA MANABU
分类号 G02F1/13;G02F1/1333;G02F1/1345;G09F9/00;H01L51/50;H05B33/06;H05B33/10;H05B33/14;(IPC1-7):G02F1/134;G02F1/133 主分类号 G02F1/13
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