| 摘要 |
PROBLEM TO BE SOLVED: To measure an optical characteristic of a projection optical system with the good accuracy and reproducibility in a short time. SOLUTION: A light exposure is altered within a scope of at least an appropriate light exposure or below, while sequentially transferring a measuring pattern disposed on a reticle R to a wafer W disposed on an image plane side of a projection optical system PL to form a first region composed of a plurality of block regions on the wafer. Next, of the plurality of block regions, information regarding at least a part of the plurality of block regions which become a boundary in which an image of the measuring pattern starts emerging is detected. In this case, as the information regarding at least a part of the plurality of block regions which become a boundary in which the image of the measuring pattern starts emerging is detected, even if the light exposure made, while it is altered within a scope of at least the appropriate light exposure or below, it does not hinder the detection in particular. The optical characteristic of the projection optical system PL is acquired based on the detected results. COPYRIGHT: (C)2004,JPO&NCIPI |
