发明名称 Mask, exposure apparatus, and exposure method
摘要 Disclosed is an exposure method which includes the steps of closely contacting, to a workpiece, a mask having an opening formed with lengthwise directions extending in orthogonal directions, and projecting, onto the mask, exposure light being polarized in a direction other than the directions mentioned above.
申请公布号 US2004137338(A1) 申请公布日期 2004.07.15
申请号 US20030663691 申请日期 2003.09.17
申请人 CANON KABUSHIKI KAISHA 发明人 INAO YASUHISA;KURODA RYO
分类号 G03F1/08;B82B3/00;B82Y10/00;B82Y40/00;G03F1/42;G03F1/70;G03F1/76;G03F7/20;H01L21/027;(IPC1-7):G03F9/00;G03C5/00;G03B27/00 主分类号 G03F1/08
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