发明名称 EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an exposure apparatus which extends the life of a spatial modulation element without exchanging spatial modulation elements against deterioration in the spatial modulation element due to light energy or the like. SOLUTION: A DMD (digital micromirror device) 42 is held by a DMD guide frame 60 and is made slidable (in the plane direction of the DMD 42) relative to the DMD guide frame 60 by using a screw 62 so that the irradiation region 68 of a light beam entering from a reflection mirror 40 can be varied in accordance with the screwing depth of the screw 62. Even when the irradiation region 68 of the DMD 42 deteriorates to render the DMD 42 no more usable, the DMD 42 can be continuously used by changing the irradiation region 68 of the light beam entering from the reflection mirror 40 onto the DMD 42. Thus, the life of the DMD 42 is improved several times and the running cost can be significantly decreased. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004191660(A) 申请公布日期 2004.07.08
申请号 JP20020359738 申请日期 2002.12.11
申请人 FUJI PHOTO FILM CO LTD 发明人 SUMI KATSUTO;FUJII TAKESHI
分类号 G03F7/20;H01L21/027;H05K3/00;(IPC1-7):G03F7/20 主分类号 G03F7/20
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