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发明名称
Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
摘要
申请公布号
EP1382716(A3)
申请公布日期
2004.07.07
申请号
EP20030015605
申请日期
2003.07.15
申请人
AIR PRODUCTS AND CHEMICALS, INC.
发明人
JI, BING;MOTIKA, STEPHEN ANDREW;PEARLSTEIN, RONALD MARTIN;KARWACKI, EUGENE JOSEPH JR.;WU, DINGJUN
分类号
B01J19/08;B08B7/00;C23C16/44;H01L21/306;H01L21/3065;H01L21/31;(IPC1-7):C23F4/00
主分类号
B01J19/08
代理机构
代理人
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