发明名称 Photoresist compositions comprising blends of ionic and non-ionic photoacid generators
摘要 The invention provides new photoresist compositions that contain a resin binder and a blend of non-ionic and ionic PAGS. Preferred resists of the invention preferably are imaged with 248 nm and/or 193 nm exposure wavelengths to provide highly resolved small dimension features.
申请公布号 US6740467(B2) 申请公布日期 2004.05.25
申请号 US20010860938 申请日期 2001.05.18
申请人 SHIPLEY COMPANY, L.L.C. 发明人 TREFONAS, III PETER
分类号 G03F7/004;G03F7/11;(IPC1-7):G03F7/004 主分类号 G03F7/004
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