Verfahren zur maskenlosen Formation von Metall-Nanostrukturen in dünnen dielektrischen Schichten mittels Bestrahlung mit ultrakurzen Laserimpulsen

摘要

A maskless process for forming metallic nanostructures in thin dielectric layers comprises irradiating a multilayer dielectric containing metallic nanoparticles or thin metal layers with ultrashort laser pulses in an infinite field arrangement with a structure breadth not greater than the laser wavelength.