发明名称 METHOD FOR SELECTIVELY FORMING CARBON-CONTAINING FILM WITH CHEMICAL VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To selectively form a carbon-containing film having sufficient hardness, high stickiness to a base body, small friction coefficient and three-dimensionally uniform film thickness to a necessary position on the surface of the base body with a chemical vapor deposition (CVD) method. SOLUTION: The carbon-containing film is formed by using a carbon-containing film raw material 23 containing at least one among group composed of acetylacetone, acetylacetonate ligand, dipivaloil methane, dipivaloil methanate ligand andβdiketone anion with the CVD. Then, the material on the surface of the base body 1 formed with the carbon-containing film partially has difference and the carbon-containing film is selectively formed on the base body 1 by utilizing the difference of coating efficiency according to this material. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004137567(A) 申请公布日期 2004.05.13
申请号 JP20020304037 申请日期 2002.10.18
申请人 TOHOKU RICOH CO LTD 发明人 NOGUCHI MASAHIRO;SAITO HARUTAKA
分类号 C23C16/04;C23C16/26;(IPC1-7):C23C16/04 主分类号 C23C16/04
代理机构 代理人
主权项
地址