SEMICONDUCTOR FILM, A METHOD FOR MANUFACTURING THE FILM, A SEMICONDUCTOR DEVICE INCLUDING A THIN FILM TRANSISTOR WHICH USES A CRYSTALLINE SEMICONDUCTOR FILM AS AN ACTIVE REGION BY CRYSTALLIZING A NON-CRYSTALLINE SEMICONDUCTOR FILM, AND A MANUFACTURING METHOD THEREOF

摘要

PURPOSE: A semiconductor film, a method for manufacturing the film, a semiconductor device including a thin film transistor which uses a crystalline semiconductor layer as an active region by crystallizing a non-crystalline semiconductor layer, and a manufacturing method thereof are provided to reduce a residual catalyst on an operating region of a crystalline semiconductor film while preserving crystal structure. CONSTITUTION: A crystalline semiconductor film is formed on an insulating surface. The semiconductor film includes a catalyst element that is capable of promoting crystallization of a semiconductor material of the semiconductor film. The semiconductor film includes at least one region having a plurality of minute holes(107) formed therein. The at least one region of the semiconductor film includes substantially no high-quality semiconductor compound of the catalyst element. The catalyst element is present in a form of solid solution in the crystalline semiconductor film. The semiconductor film is substantially made of Si, the catalyst element is a metal element M, and the high quality semiconductor compound has a composition of MxSiy(x>y).