| 摘要 |
In a waste gas abatement system for abating gas from a semiconductor processing apparatus (1), the waste gas abatement system comprises one or more treatment devices (3, 8, 10) for treating waste gas, and the abatement system further comprises a fuel cell (12). At least one treatment device (3, 8, 10) is arranged to generate a fuel for the fuel cell (12) and the fuel cell (12) is connected to an electrically powered device of the waste gas abatement system or of the semiconductor processing apparatus (1) so as to be able to power wholly or in part said electrically powered device. The abatement system allows waste gases from semiconductor processing to be used to improve the efficiency of a semiconductor processing step and/or of the abatement system itself by generating energy for use therein. |
