发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce a forward voltage drop and its variation, to improve the trade-off of the forward voltage drop and reverse recovery loss, and to make a current softly recovered. SOLUTION: On an n-cathode layer 1 in which antimony is doped, an epitaxial growth layer 20 is formed while doping phosphorous, and a impurity concentration in the epitaxial growth layer 20 is gradually increased from an n<SP>+</SP>-layer 1 side to a central part (Xp) and gradually decreased from the central part (Xp) toward the surface of the epitaxial growth layer 20. A p-anode layer 3 is formed in the surface layer of the epitaxial growth layer 20, and an n<SP>+</SP>-layer 4 is formed by introducing As of 1×10<SP>18</SP>cm<SP>-3</SP>or higher in a surface concentration in the surface layer of the n-cathode layer 1. An ohmic contact between the cathode electrode 6 and the cathode layer 1 is ensured by forming the n<SP>+</SP>-layer 4, thereby reducing an ON voltage (a forward voltage drop) and its variation. Also the trade-off of the forward voltage drop and the reverse recovery loss can be improved. Moreover, the current can be softly recovered by enhancing the concentration in the central part Xp of the n-drift layer. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004039842(A) 申请公布日期 2004.02.05
申请号 JP20020194399 申请日期 2002.07.03
申请人 FUJI ELECTRIC HOLDINGS CO LTD 发明人 NAITO TATSUYA;NEMOTO MICHIO;KANAMARU HIROSHI
分类号 H01L21/28;H01L21/329;(IPC1-7):H01L21/329 主分类号 H01L21/28
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