| 摘要 |
A method for forming a display device, includes forming a thin film transistor (TFT), a gate pad and a data pad on a substrate; depositing sequentially an inorganic insulating material and an organic insulating material on the substrate having the TFT, the gate pad and the data pad; selectively removing the organic insulating material using a diffracting mask to form a patterned organic insulating layer; selectively removing the inorganic insulating material, using at least a portion of the patterned organic insulating layer as a mask to define contact holes for the TFT, the gate pad and the data pad; and forming electrodes in the contact holes. |
