| 摘要 |
The invention seeks to provide an electric optical apparatus and a manufacturing method thereof, in which when forming a contact hole by wet etching for controlling an electric potential of a light-shielding layer, etching liquid does not infiltrate the bonding boundary between a supporting substrate and a semiconductor substrate. An electric optical apparatus includes a first insulator layer 206b formed on the underside of a semiconductor layer 1a, a second insulator layer 12 formed on the side lower than the first insulator layer 206b, a light-shielding layer 11a formed between the first insulator layer 206b and the second insulator layer 12, and a contact hole 13 passing through at least the first insulator layer 206b to the light-shielding layer 11a, wherein the light-shielding layer 11a is located at a position upper than that of the bonding boundary between a supporting substrate 10A and a semiconductor substrate. <IMAGE> |
