| 摘要 |
PROBLEM TO BE SOLVED: To provide a low-cost drying method for a quartz substrate capable of reducing foreign matters on a substrate surface when drying the quarts substrate after the washing, and obtaining the quarts substrate without a watermark. SOLUTION: In this drying method for the washed quartz substrate, at least a process for heating the quartz substrate by hot water after a process for washing the quartz substrate is applied, and a drying process for executing at least one of spin-drying, hot-air drying, decompression drying, and drying by an infrared lamp, or the like, is applied. COPYRIGHT: (C)2004,JPO
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