发明名称 |
METHOD AND DEVICE FOR MANUFACTURING THIN FILM, AND METHOD FOR MANUFACTURING SOLAR CELL AND SOLAR CELL |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and a device for forming a thin film and a manufacturing method of a solar cell, which can obtain a thin film of desired property without influence of material gas and residue in a first thin film formation process on property of a thin film formed in a second thin film formation process, and eliminate the need for providing a plurality of chambers since a plurality of thin films are formed inside the same chamber, thus realizing miniaturization and cost reduction of a device. <P>SOLUTION: The thin film formation device 1 for forming a plurality of thin films in a substrate 10 in the same chamber 2 by an antenna type plasma CVD method (chemical vapor deposition) has a residue removal means for removing residue which affects property of a second thin film formed next to a first thin film of a plurality of thin films and is caused in a first thin film formation process. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004006537(A) |
申请公布日期 |
2004.01.08 |
申请号 |
JP20020160677 |
申请日期 |
2002.05.31 |
申请人 |
ISHIKAWAJIMA HARIMA HEAVY IND CO LTD |
发明人 |
UEDA HITOSHI;TAKAGI TOMOKO;ITO NORIKAZU |
分类号 |
C23C16/44;C23C16/00;C23C16/24;C23C16/505;H01L21/205;H01L31/04;H05H1/24;(IPC1-7):H01L21/205 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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