| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for plasma treatment by which the temperature controllability of a substrate is improved, and to provide a tray for plasma treatment. <P>SOLUTION: A vacuum chamber is evacuated by a pump while a predetermined gas is supplied to the chamber by a gas supply apparatus. A plasma is generated in the chamber by applying high frequency power from a high frequency power supply for coil to a coil while the pressure of the chamber is controlled to be at a predetermined level. Thus, a substrate mounted on a substrate electrode is subjected to plasma treatment. At this time, an adhesive sheet is provided between the substrate electrode and the substrate and thus the temperature controllability can be improved. <P>COPYRIGHT: (C)2004,JPO |
