| 摘要 |
PURPOSE: A radiation sensitive or heat sensitive composition and its compound are provided, to improve sensitivity, pattern profile and rare and dense dependence and to prevent the generation of particles even during storage. CONSTITUTION: The radiation sensitive composition comprises a compound capable of generating an acid or a radical by external stimulus represented by the formula I, wherein Ar is an aryl group or an aromatic group containing a hetero atom; R6 is H, a cyano group, an alkyl group or an aryl group; R7 is a monovalent organic group; Y1 and Y2 are identical or different each other and are an alkyl group, an aryl group, an aralkyl group or an aromatic group containing a hetero atom, and Y1 and Y2 can form a ring together; Ar can form a ring together with at least one between Y1 and Y2; Ar can form a ring together with R6; R6 can form a ring together with R7; Ar, R6, R7, Y1 or Y2 can combine by a linking group at any one point to form two or more structure of the formula I; and X- is a non-nucleophilic anion. The external stimulus is heat or the irradiation of an active ray.
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