| 摘要 |
The present invention relates to the depositing of carbon and carbon-based materials to produce hard carbon films or carbon-based films. The present methods for producing carbon films and carbon-based films include chemical vapour deposition and filtered arc systems. Both have problems. The present invention discloses a method and apparatus which utilises an arc system comprising an anode and a cathode both of graphite. The graphite anode is used to produce the carbon or carbon-based film precursor material. In order to control the quality and rate of deposition of the precursor material onto a substrate, the arc attachment area to the anode is controlled. Minimising the arc attachment area can increase the rate of deposition.
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