| 发明名称 |
Acetal/alicyclic polymers and photoresist compositions |
| 摘要 |
The invention includes polymers that contain an alicyclic group (cage group) and acetal group which can undergo a deblocking reaction in the presence of photogenerated acid. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-300 nm and sub-200 nm.
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| 申请公布号 |
US2003232273(A1) |
申请公布日期 |
2003.12.18 |
| 申请号 |
US20020268063 |
申请日期 |
2002.10.09 |
| 申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
ADAMS TIMOTHY G.;COLEY SUZANNE |
| 分类号 |
G03F7/039;C08F216/38;H01L21/027;(IPC1-7):G03F7/038;G03C1/492;G03C1/76 |
主分类号 |
G03F7/039 |
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