发明名称 High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems
摘要 Devices and methods are disclosed that provide effective utilization of light beams produced from multiple EUV-light sources, especially such sources that have been bundled. An embodiment of an EUV-source device comprises multiple individual EUV-light sources each providing a respective point-light source of EUV radiation propagating as a respective beam from each point-light source. A reflective focusing-optical system is situated downstream of the EUV-light sources, and is configured to focus the beams from the point-light sources at a focus point. A variable-angle mirror is situated downstream of the focusing-optical system and is configured to reflect light of the respective beams from the point-light sources that has been reflected by the focusing-optical system. A mirror-tilting mechanism is coupled to the variable-angle mirror. The mechanism, when activated, tilts the mirror by a respective angle corresponding to the particular beam from one of the point-light sources that is incident on the mirror. This produces a composite beam propagating in a constant direction from the variable-angle mirror.
申请公布号 US2003223544(A1) 申请公布日期 2003.12.04
申请号 US20020319337 申请日期 2002.12.12
申请人 NIKON CORPORATION 发明人 MURAKAMI KATSUHIKO
分类号 G21K1/06;G03F7/20;G21K5/02;H01L21/027;H05G2/00;(IPC1-7):H05H1/00 主分类号 G21K1/06
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