| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having a smooth surface and excellent adhesiveness to a substrate when transferred to the substrate and leaving little residue on development. <P>SOLUTION: The photosensitive resin composition contains a fluoropolymer, wherein the fluoropolymer is a copolymer of (i) an acrylate or (meth)acrylate having a specified fluoroaliphatic group, (ii) an oxyalkylene(meth)acrylate represented by formula (1) and (iii) a monomer having a carboxyl group or a sulfonic acid group in its molecule. Units of the acrylate or methacrylate (i) are contained in the copolymer by 40 to 70 mass%, the monomer (iii) is contained by 1 to 20 mass% and the weight average molecular weight of the fluoropolymer is≥20,000. A photosensitive transfer sheet having a layer formed of the photosensitive resin composition is also provided. <P>COPYRIGHT: (C)2004,JPO</p> |
