RAW MATERIAL COMPOUND FOR CVD, AND METHOD FOR CHEMICAL VAPOR-PHASE DEPOSITION OF THIN FILM OF RUTHENIUM OR RUTHENIUM COMPOUND,申请号KR20030023681-传众专利搜索

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发明名称	RAW MATERIAL COMPOUND FOR CVD, AND METHOD FOR CHEMICAL VAPOR-PHASE DEPOSITION OF THIN FILM OF RUTHENIUM OR RUTHENIUM COMPOUND
摘要
申请公布号	KR20030082909(A)	申请公布日期	2003.10.23
申请号	KR20030023681	申请日期	2003.04.15
申请人		发明人
分类号	C07C211/65;C23C16/18;C07C49/92;C07F15/00	主分类号	C07C211/65
代理机构		代理人
主权项
地址

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