发明名称 SURFACE TREATMENT SYSTEM AND METHOD
摘要 A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object of surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.
申请公布号 WO03083168(A1) 申请公布日期 2003.10.09
申请号 WO2002KR02471 申请日期 2002.12.28
申请人 LG ELECTRONICS INC.;CHO, CHEON-SOO;YOUN, DONG-SIK;LEE, HYUN-WOOK;HA, SAMCHUL;JUN, HYUN-WOO 发明人 CHO, CHEON-SOO;YOUN, DONG-SIK;LEE, HYUN-WOOK;HA, SAMCHUL;JUN, HYUN-WOO
分类号 C23C16/44;C23C16/455;C23C16/54 主分类号 C23C16/44
代理机构 代理人
主权项
地址
您可能感兴趣的专利