| 摘要 |
An apparatus for supporting a substrate and a method for positioning a substrate are provided. In one embodiment, an apparatus for supporting a substrate includes a substrate support, a stator circumscribing the substrate support, and an actuator. The actuator is coupled to the stator and adapted to change the elevation of the stator and/or adjust an angular orientation of the stator relative to its central axis. As the substrate support is magnetically coupled to the stator, a position, i.e., elevation and angular orientation, of the substrate support may be controlled.
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