METHOD AND DEVICE FOR DEPOSITING THIN FILM

摘要

PROBLEM TO BE SOLVED: To deposit a thin film having a stable composition by accelerating reaction with a reactive gas in a reaction vapor deposition method. SOLUTION: By this method for depositing a thin film on a supporting body 20 by performing vacuum vapor deposition, a reactive gas is introduced using a nozzle 40 composed of an assembly of a plurality of thin tubes, the heated reactive gas is introduced to the part for depositing the thin film as an assembly of divided gas flux. COPYRIGHT: (C)2004,JPO