| 摘要 |
A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure (104) is supported by a non-isolated structure (102). The isolated structure supports a moveable stage (108). A linear motor (110) includes a first linear motor element (118) and a second linear motor element (122). The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates (112) mount the second linear motor element on the isolated structure. A flexure rod (114) is coupled between the non-isolated structure and the second linear motor element. <IMAGE>A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure (104) is supported by a non-isolated structure (102). The isolated structure supports a moveable stage (108). A linear motor (110) includes a first linear motor element (118) and a second linear motor element (122). The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates (112) mount the second linear motor element on the isolated structure. A flexure rod (114) is coupled between the non-isolated structure and the second linear motor element. <IMAGE>
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