| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a plurality of patterns on a plastic substrate with a high accuracy of overlapping and to provide a display using the method. <P>SOLUTION: A photosensitive resin film is further laminated on a plastic substrate on which an inorganic thin film has been laminated and a prescribed pattern is formed in the photosensitive resin film by exposing the photosensitive resin film through a photomask having a prescribed pattern in an exposure step. A step for heating the plastic substrate on which an inorganic thin film has been laminated is carried out before the exposure step. Time management is carried out so that the interval from the end of the heating step to the start of the exposure step becomes a prescribed time or more according to the asymptotic shrinkage behavior of the plastic substrate after the heating step. <P>COPYRIGHT: (C)2003,JPO |
