发明名称 METHOD AND DEVICE FOR ASHING
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for ashing whereby a bank 12 is formed on a processed member 10 and ashing can be accurately performed on a predetermined position. SOLUTION: The bank 12 having solution repellency is formed on an area other than the predetermined pattern of the processed member 10, a liquid 15 reacting with ozone water 14 or processing gas 22 is applied to ashing portions 18 of the predetermined pattern by using a discharge head 16. Lyophilic processing is performed on the ashing portions 18 and the ozone water 14 or the liquid 15 is improved in a fixing property. Further, the bank 12 is formed by a film having solution repellency to prevent the ozone water 14 or the liquid 15 from adhering to the bank 12. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243355(A) 申请公布日期 2003.08.29
申请号 JP20020036641 申请日期 2002.02.14
申请人 SEIKO EPSON CORP 发明人 KOIKE TAKASHI;MORI YOSHIAKI
分类号 G02F1/13;H01L21/027;H01L21/306;(IPC1-7):H01L21/306 主分类号 G02F1/13
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