发明名称 Semiconductor memory and its production process
摘要 A semiconductor memory comprises: a first conductivity type semiconductor substrate and memory cells each constituted of an island-like semiconductor layer, a charge storage layer and a control gate, the charge storage layer and the control gate being formed to entirely or partially encircle a sidewall of the island-like semiconductor layer, wherein the memory cells are disposed in series, and the island-like semiconductor layer on which the memory cells are disposed has cross-sectional areas in a horizontal direction which vary stepwise.
申请公布号 US2003157763(A1) 申请公布日期 2003.08.21
申请号 US20020175259 申请日期 2002.06.20
申请人 ENDOH TETSUO;MASUOKA FUJIO;TANIGAMI TAKUJI;YOKOYAMA TAKASHI;TAKEUCHI NOBORU;WADA YOSHIHISA;SATO KOTA;KINOSHITA KAZUSHI 发明人 ENDOH TETSUO;MASUOKA FUJIO;TANIGAMI TAKUJI;YOKOYAMA TAKASHI;TAKEUCHI NOBORU;WADA YOSHIHISA;SATO KOTA;KINOSHITA KAZUSHI
分类号 G11C16/04;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/823 主分类号 G11C16/04
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