METHOD FOR MANUFACTURING THIN-FILM YCRO3 NTC THERMISTOR

摘要

PURPOSE: A method for manufacturing a thin-film YCrO3 NTC(Negative Temperature Coefficient) thermistor is provided to reduce the power consumption by using a high-frequency magnetron sputtering process. CONSTITUTION: Amounts of Y2O3 and Cr2O3 are weighted(S10) in order to form YCrO3 for depositing. The weighted Y2O3 and Cr2O3 are calcined at temperature of 250-350°C during 2.5 to 3.5 hours and dried in an oven at temperature of 80-120°C(S20). The dried Y2O3 and Cr2O3 are pressure-formed through a metal mold(S30). The pressure-formed Y2O3 and Cr2O3 are sintered to form YCr2O3 for depositing(S40). YCrO3 is sputtered through a high-frequency magnetron to deposit YCrO3 thin-film on a silicon wafer(S50). The deposited YCrO3 thin-film is treated with heat(S60). A platinum electrode is deposited on YCrO3 thin-film(S70).