发明名称 BUFFER ARCHITECTURE FOR BIAXIALLY TEXTURED STRUCTURES AND METHOD OF FABRICATING SAME
摘要 The invention relates to an article with an improved buffer layer architecture comprising a substrate having a metal surface, and an epitaxial buffer layer on the surface of the substrate. The epitaxial buffer layer comprises at least one of the group consisting of ZrO2, HfO2, and compounds having at least one of Ca and a rare earth element stabilizing cubic phases of ZrO2 and/or HfO2. The article can also include a superconducting layer deposited on the epitaxial buffer layer. The article can also include an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article comprises providing a substrate with a metal surface, depositing on the metal surface an epitaxial buffer layer comprising at least one material selected from the group consisting of ZrO2, HfO2, and compounds having at least one of Ca and a rare earth element stabilizing cubic phases of at least one of ZrO2 and HfO2. The epitaxial layer depositing step occurs in a vacuum with a background pressure of no more than 1x10-5 Torr. The method can further comprise depositing a superconducting layer on the epitaxial layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.
申请公布号 US2003143438(A1) 申请公布日期 2003.07.31
申请号 US19990406190 申请日期 1999.09.27
申请人 NORTON DAVID P.;PARK CHAN;GOYAL AMIT 发明人 NORTON DAVID P.;PARK CHAN;GOYAL AMIT
分类号 C21D8/12;C23C14/02;C23C18/12;C30B5/00;C30B23/02;C30B25/02;H01L39/24;(IPC1-7):B32B15/04 主分类号 C21D8/12
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