发明名称 EXPOSING METHOD AND DEVICE THEREOF
摘要 PROBLEM TO BE SOLVED: To need no mechanical shutter when a liquid crystal display element is used instead of a mask to form an optional circuit pattern. SOLUTION: A liquid crystal display element 8 is used as a mask to form an exposing pattern for substrate formation, the exposing pattern is divided into a plurality of discontinuous patterns where the picture element opening of the liquid crystal display element 8 is formed as one dot, and then a wafer stage 10 is shifted at a specified pacing vertically and horizontally to expose the respective divided patterns repeatedly. When the patterns are joined and a continuous pattern image is formed on an exposed body applied with a resist, the exposed area of the liquid crystal display element 8 is shown in black during movement and alignment of the wafer stage 10. After the wafer stage 10 arrives at a target position, a specified pattern is indicated in the exposed area of the liquid crystal display element 8 and it is exposed. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003197512(A) 申请公布日期 2003.07.11
申请号 JP20010399442 申请日期 2001.12.28
申请人 SONY CORP 发明人 MIZUGUCHI YOSHIHIRO;SHIMA SHUICHI;IGUCHI TSUNEO
分类号 G02F1/13;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02F1/13
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