| 发明名称 |
PHOTOMASK BLANK, PHOTOMASK AND METHOD FOR MANUFACTURING THE SAME |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To decrease the film stress in a light shielding film containing a layer having an antireflective function in the manufacture of a photomask blank. <P>SOLUTION: The photomask blank 1 comprises a light shielding film containing an antireflection film 5 having an antireflective function and formed on a transparent substrate 2. The light shielding film has a layered structure of a first light shielding film 3 made of chromium nitride and a second light shielding film 4 made of chromium carbide as well as the antireflection film 5. The light shielding film is deposited to 60 to 77 nm total film thickness. <P>COPYRIGHT: (C)2003,JPO</p> |
| 申请公布号 |
JP2003195483(A) |
申请公布日期 |
2003.07.09 |
| 申请号 |
JP20010399790 |
申请日期 |
2001.12.28 |
| 申请人 |
HOYA CORP |
发明人 |
YAMADA TAKAYUKI;MITSUI MASARU;USHIDA MASAO |
| 分类号 |
G03F1/50;G03F1/58;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/50 |
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