| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition capable of ensuring both high sensitivity and high resolving power and excellent in isolation performance. <P>SOLUTION: The negative resist composition is characterized in containing (A) a compound which generates an acid upon irradiation with an actinic ray or a radiation, (B) a resin soluble in an alkaline aqueous solution, (C) a compound which has an alcohol structure and is excited by the acid generated by the component (A) to lower the alkali solubility of a resist film, (D) a crosslinking agent which is excited by the acid generated by the component (A) to cause a crosslinking reaction and (E) a solvent. <P>COPYRIGHT: (C)2003,JPO |
