POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN,申请号AU20020354273-传众专利搜索

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发明名称	POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
摘要
申请公布号	AU2002354273(A1)	申请公布日期	2003.06.17
申请号	AU20020354273	申请日期	2002.11.29
申请人	TOKYO OHKA KOGYO CO., LTD.	发明人	HIDEO HADA;SATOSHI FUJIMURA;JUN IWASHITA
分类号	C08F220/18;C08F220/28;G03F7/039;H01L21/027;(IPC1-7):G03F7/039	主分类号	C08F220/18
代理机构		代理人
主权项
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