SEMICONDUCTOR PROCESS CHAMBER SYSTEM

摘要

PURPOSE: A semiconductor process chamber system is provided to be capable of minimizing the particle problem due to by-product by collecting the by-product remaining in a vacuum chamber using a collection part. CONSTITUTION: A semiconductor wafer(120) is loaded in a vacuum chamber(100). A coil(150) is located at the outside of the vacuum chamber(100) for generating plasma(160). A plasma generator(140) is connected to the coil(150). A susceptor(110) is located on the lower portion of the vacuum chamber(100) for loading the semiconductor wafer(120) and simultaneously using the same as an electrode. An RF(Radio Frequency) generator(130) is connected to the susceptor(110). A collection electrode(180) is installed at the inner wall of the vacuum chamber(100) for collecting by-product remaining in the vacuum chamber(100). A collection generator(170) is connected to the collection electrode(180).